Performance of double junction a-Si solar cells by using ZnO:Al films with different electrical and optical properties at the n/metal interface
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作者:
Ray, S
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Indian Assoc Cultivat Sci, Energy Res Unit, Jadavpur 700032, Kolkata, IndiaIndian Assoc Cultivat Sci, Energy Res Unit, Jadavpur 700032, Kolkata, India
Ray, S
[1
]
Das, R
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Indian Assoc Cultivat Sci, Energy Res Unit, Jadavpur 700032, Kolkata, IndiaIndian Assoc Cultivat Sci, Energy Res Unit, Jadavpur 700032, Kolkata, India
Das, R
[1
]
Barua, AK
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Indian Assoc Cultivat Sci, Energy Res Unit, Jadavpur 700032, Kolkata, IndiaIndian Assoc Cultivat Sci, Energy Res Unit, Jadavpur 700032, Kolkata, India
Barua, AK
[1
]
机构:
[1] Indian Assoc Cultivat Sci, Energy Res Unit, Jadavpur 700032, Kolkata, India
High-quality ZnO:Al films have been prepared by using RF-magnetron-sputtering method with resistivity ranging from 10(-1) to 10(-4) Omega cm and transmittance above 90% in visible region. We have fabricated small area (1 cm(2)) double junction (a-Si/a-Si) solar cells using ZnO/Al and ZnO/Ag as back contact. The conversion efficiency of double junction a-Si solar cell increases from 9.9% to 10.9% by using ZnO/Al back contact and to 11.4% by using ZnO/Ag as back contact. Effect of variation of thickness of i-layer on performance of the cell has also been studied. (C) 2002 Elsevier Science B.V. All rights reserved.