Vibrational study of indium phosphide oxides

被引：10

作者：

Pluchery, O ^{[1
]}

Eng, J ^{[1
]}

Opila, RL ^{[1
]}

Chabal, YJ ^{[1
]}

机构：

[1] Agere Syst, Mat Res, Murray Hill, NJ 07974 USA

来源：

SURFACE SCIENCE | 2002年 / 502卷

关键词：

infrared absorption spectroscopy; indium phosphide; X-ray photoelectron spectroscopy; growth;

D O I：

10.1016/S0039-6028(01)01901-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Passivation of semi-insulating indium phosphide surfaces by various types of oxides is investigated with infrared absorption spectroscopy (IRAs) and X-ray photoelectron spectroscopy (XPS). The difficulty in studying oxide-related modes in the 800-1300 cm(-1) range is due to the bulk phonon absorption of the InP substrate and has stimulated the optimization of single-pass "external" transmission as well as multiple internal reflection geometries for ex situ and in situ studies, respectively. The nature of oxides prepared commercially for epitaxy (epi-ready) and oxides prepared by wet chemistry is studied as well as the wet chemical etching of such oxides, including the reactivity of InP in various solutions. Combining XPS and polarization-dependent IRAs, we find that epi-ready oxides tend to be porous, and plasma-grown oxides denser. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：75 / 80

页数：6

共 11 条

[1] AN INVESTIGATION BY ELECTRON-SPECTROSCOPY FOR CHEMICAL-ANALYSIS OF CHEMICAL TREATMENTS OF THE (100) SURFACE OF N-TYPE INP EPITAXIAL LAYERS FOR LANGMUIR FILM DEPOSITION [J].