A water-resistant precursor in a wet process for TiO2 thin film formation

被引:41
作者
Sato, M
Hara, H
Nishide, T
Sawada, Y
机构
[1] NISSAN MOTOR CO LTD,RES CTR,YOKOSUKA,KANAGAWA 237,JAPAN
[2] TOKYO INST POLYTECH,FAC ENGN,DEPT IND CHEM,ATSUGI,KANAGAWA 24302,JAPAN
关键词
D O I
10.1039/jm9960601767
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Deposition of anatase TiO2 thin films on soda-lime glass has been achieved by firing an adhered precursor titanium(rv) complex of ethylenediamine-N,N,N',N'-tetraacetic acid (H(4)edta) between 450 and 550 degrees C in air. The coating solution was prepared by the reaction of a neutral [Ti(H2O)(edta)] complex, obtained from TiCl3 and H(4)edta in an air-oxidation process, with dipropylamine in ethanol. The crystal structures of the oxide films on glass substrates were examined by XRD, and some of their optical properties and electronic structure were investigated by XPS. It was shown that TiO2 information was attainable employing a water-resistant precursor derived from a stable metal complex. The thermal properties of the initial [Ti(H2O)(edta)] complex and the facile preparation of the precursor ethanol solution are also reported.
引用
收藏
页码:1767 / 1770
页数:4
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