Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

被引：7

作者：

Liu, X

Aitchison, JS

DeLaRue, RM

Thoms, S

Zhang, L

Williams, JAR

Bennion, I

机构：

[1] Dept. of Electron. and Elec. Eng., University of Glasgow

[2] Dept. Electron. Eng. and Appl. Phys., Aston University, Birmingham B4 7ET, Aston Triangle

来源：

MICROELECTRONIC ENGINEERING | 1997年 / 35卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(96)00102-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

引用

页码：345 / 348

页数：4

共 6 条

[1]

Bennion I, 1996, OPT QUANT ELECTRON, V28, P93, DOI 10.1007/BF00278281

[2] PHOTOSENSITIVITY IN OPTICAL FIBER WAVEGUIDES - APPLICATION TO REFLECTION FILTER FABRICATION [J].