Kinetic lattice Monte Carlo simulation of facet growth rate

被引：50

作者：

Wang, ZY ^{[1
]}

Li, YH

Adams, JB

机构：

[1] Arizona State Univ, Sci & Engn Mat Program, Tempe, AZ 85287 USA

[2] Arizona State Univ, Dept Chem Bio & Mat Engn, Tempe, AZ 85287 USA

来源：

SURFACE SCIENCE | 2000年 / 450卷 / 1-2期

基金：

美国国家科学基金会;

关键词：

adatoms; copper; diffusion and migration; growth; metallic films; models of surface kinetics; Monte Carlo simulations; surface diffusion;

D O I：

10.1016/S0039-6028(99)01250-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We present a kinetic lattice Monte Carlo simulation model that describes deposition, surface self-diffusion (including single adatom, dimer and ledge adatom diffusion), nucleation and film growth on fee metal substrates. The activation energies for diffusion are calculated using the embedded-atom method. Using this model, we determine the relative growth rates of(100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size. The effects of relative growth rates on the microstructural evolution of Cu films are discussed. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：51 / 63

页数：13

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