Additive-driven phase-selective chemistry in block copolymer thin films: The convergence of top-down and bottom-up approaches

被引:87
作者
Du, P
Li, MQ
Douki, K
Li, XF
Garcia, CRW
Jain, A
Smilgies, DM
Fetters, LJ
Gruner, SM
Wiesner, U
Ober, CK
机构
[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA
[2] Cornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14853 USA
[3] Cornell Univ, Dept Chem & Biomol Engn, Ithaca, NY 14853 USA
[4] Cornell Univ, Dept Phys, Ithaca, NY 14853 USA
关键词
D O I
10.1002/adma.200306189
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Several strategies are demonstrated for the use of additive-driven chemistries that take place in only one type of the nanosized domains of all-organic and organic-inorganic hybrid block copolymer thin films. Such an approach is used to examine the convergence of "top-down" and "bottom-up" fabrication via light-driven processes. Characterization is carried out with microscopies and grazing-incidence small-angle X-ray scattering (see Figure and cover).
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页码:953 / +
页数:6
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