Photoinduced redox reaction coupled with limited electron mobility at metal oxide surface

被引:51
作者
Uetsuka, H
Onishi, H
Henderson, MA
White, JM
机构
[1] Kanagawa Acad Sci & Technol, Surface Chem Lab, KSP, Kawasaki, Kanagawa 2130012, Japan
[2] Pacific NW Natl Lab, Interfacial Chem & Engn Grp, Richland, WA 99352 USA
关键词
D O I
10.1021/jp0484027
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Photoinduced oxidation of trimethyl acetate (TMA) was examined on an atomically flat surface of rutile TiO2. The macroscopic rate of reaction (the partial pressure of desorption products) was temporary modulated when a TMA-covered surface was UV-irradiated in oxygen gas. Scanning tunneling microscope imaging revealed spatially modulated distribution of TMA and OH on that surface. The limited surface mobility of electrons photoexcited and trapped at OH-associated Ti sites was proposed to cause the temporal and spatial modulations. The characteristic length of the spatial modulation, i.e., the lateral dimension of electron confinement, was a few lattice constants of the oxide.
引用
收藏
页码:10621 / 10624
页数:4
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