Dynamic particle removal by nanosecond dry laser cleaning:: Theory

被引：20

作者：

Arnold, N ^{[1
]}

Schrems, G ^{[1
]}

Mühlberger, T ^{[1
]}

Bertsch, M ^{[1
]}

Mosbacher, M ^{[1
]}

Leiderer, P ^{[1
]}

Bäuerle, D ^{[1
]}

机构：

[1] Johannes Kepler Univ Linz, A-4040 Linz, Austria

来源：

SECOND INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2002年 / 4426卷

关键词：

laser cleaning; modeling; adhesion; oscillations; SiO2; Si; LPM2001;

D O I：

10.1117/12.456828

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A model for ns dry laser cleaning that treats the substrate and particle expansion on a unified basis is suggested. Formulas for the time-dependent thermal expansion of the substrate, valid for temperature-dependent parameters are derived. Van der Waals adhesion, the elasticity of the substrate and particle, as well as particle inertia is taken into account for an arbitrary temporal profile of the laser pulse. Time scale related to the size of the particles and the adhesion/elastic constants is revealed. Cleaning proceeds in different regimes if the duration of the laser pulse is much shorter/longer than this characteristic time. Expressions for cleaning thresholds are provided and compared with experiments on the cleaning of Si surfaces from spherical SiO2 particles with radii between 200 and 2585 run in vacuum with 248 run KrF excimer laser and 532 rim frequency doubled Nd-YAG laser. Large discrepancies between the experimental data and theoretical results for KrF laser suggest that ns dry laser cleaning cannot be explained on the basis of thermal expansion mechanism alone.

引用

页码：340 / 346

页数：3

共 24 条

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