X-ray photoelectron spectroscopy study of thin oxide lavers formed on (001)-oriented β-NiAl single crystal surfaces

被引:30
作者
Frémy, N [1 ]
Maurice, V [1 ]
Marcus, P [1 ]
机构
[1] Ecole Natl Super Chim Paris, Lab Physicochim Surfaces, CNRS, UMR 7045, F-75231 Paris 05, France
关键词
NiAl(001); alumina; x-ray photoelectron spectroscopy; low-energy electron diffraction; scanning tunnelling microscopy; thin oxide films;
D O I
10.1002/sia.1351
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Quantitative XPS data complemented by low-energy electron diffraction (LEED) and scanning tunnelling microscopy (STM) results of the very first stages of oxidation of an NiAl(001) single-crystal surface are reported. The thickness, stoichiometry and alloy composition at the oxide/alloy interface and, when possible, the structure have been analysed after oxidation at room temperature and 750degreesC and under 10(-7), 10(-5) and 200 mbar of oxygen. The growth of alumina layers is essentially two-dimensional in the initial stages. Thin oxide films grown up to 50 A show an oxygen enrichment that decreases with increasing thickness. The competition between the segregation of aluminium and its consumption by oxygen in the growth kinetics of the oxide layers is evidenced by the variation of the stoichiometry of the oxide films and alloy composition at the oxide/alloy interface. Copyright (C) 2002 John Wiley Sons, Ltd.
引用
收藏
页码:519 / 523
页数:5
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