Photoluminescence lifetime distribution of a-Si:H and a-Ge:H expanded to nanosecond region using wide-band frequency-resolved spectroscopy

被引:20
作者
Aoki, T [1 ]
Komedoori, S
Kobayashi, S
Fujihashi, C
Ganjoo, A
Shimakawa, K
机构
[1] Tokyo Inst Polytech, Dept Elect & Comp Engn, Atsugi, Kanagawa 2430297, Japan
[2] Tokyo Inst Polytech, Joint Res Ctr High Technol, Atsugi, Kanagawa 2430297, Japan
[3] Gifu Univ, Dept Elect & Elect Engn, Gifu 5011193, Japan
关键词
D O I
10.1016/S0022-3093(01)00972-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present the first survey on quadrature frequency-resolved spectroscopy (QFRS) spectra in the nanosecond (ns) region of photoluminescence (PL) of a-Si:H and a-Ge:H. Our QFRS study reveals that there is no evidence of a peak or shoulder for the ns PL lifetime component, and thus the PL lifetime distribution has basically a double-peak structure with two components of mus and ms lifetimes in both materials. The ps component in the lifetime distribution is enhanced at higher PL photon energy, which favors the exciton model. Generation rate (G) dependence of QFRS spectra shows a common feature, for both a-Si:H and a-Ge:H. where excitonic emission shifts to non-geminate radiative recombination as G increases. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:642 / 647
页数:6
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