Zero-dimensional states in a quantum dot, formed at threshold in a disordered submicron silicon transistor

被引:1
作者
Peters, MG
Dijkhuis, JI
Molenkamp, LW
机构
[1] Univ Utrecht, Fac Phys & Astron, NL-3508 TA Utrecht, Netherlands
[2] Univ Utrecht, Debye Inst, NL-3508 TA Utrecht, Netherlands
[3] Rhein Westfal TH Aachen, Inst Phys, D-52056 Aachen, Germany
关键词
D O I
10.1088/0268-1242/14/12/319
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Single-electron tunnelling is studied in a narrow submicron metal-oxide-semiconductor field-effect transistor (MOSFET) equipped with a gate on three sides of the channel. Coulomb oscillations are observed below 20 K, while a much broader structure persists up to 50 K. Every conductance peak is found to decrease with temperature, corresponding to a single-level resonance. The observed temperature dependence of the peak height and the presence of an intrinsic line width imply the participation of a constant number of energy levels in the zero-dimensional transport. At the same time, the peak spacing varies strongly from peak to peak, which is further evidence of quantum-mechanical transport through zero-dimensional states.
引用
收藏
页码:1119 / 1123
页数:5
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