MFM imaging of patterned permalloy elements under an external applied field

被引：24

作者：

García, JM

Thiaville, A

Miltat, J

Kirk, KJ

Chapman, JN

机构：

[1] CNRS, Phys Solides Lab, F-91405 Orsay, France

[2] Univ Paris 11, F-91405 Orsay, France

[3] Univ Glasgow, Dept Phys & Astron, Glasgow, Lanark, Scotland

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2002年 / 242卷

关键词：

magnetic force microscopy; micromagnetic calculations; permalloy; domain structure;

D O I：

10.1016/S0304-8853(01)01027-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The magnetization process of micron-sized permalloy elements submitted to in-plane magnetic fields is analyzed by means of magnetic force microscopy (MFM). Depending on the magnetic history of the sample and on the value of the applied field, high remanence domain structures (the so-called S- and C-states) as well as flux closure configurations (Landau and diamond patterns) are observed. Perturbations induced by the MFM tip are found, and the results are discussed with the help of micromagnetic simulations, (C) 2002 Elsevier Science B.V. All rights reserved.

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页码：1267 / 1269

页数：3

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