Thermal stability of electrodeposited nanocrystalline nickel

被引:27
作者
Abraham, M
Holdway, P
Thuvander, M
Cerezo, A
Smith, GDW
机构
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[2] QinetiQ Ltd, Struct & Mat Ctr, Farnborough GU14 0LX, Hants, England
[3] ESAB AB, SE-40277 Gothenburg, Sweden
关键词
D O I
10.1179/026708401225002749
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of annealing electrodeposited nanocrystalline nickel at 250degreesC was studied by microhardness testing, XRD, TEM and three-dimensional atom probe (3DAP) analysis. TEM micrographs revealed that the type of growth is abnormal, i.e. a composite structure is formed with some large (> 1 mum) grains embedded in a matrix of nanometre sized grains. 3DAP studies showed no grain boundary segregation in as deposited materials and only low levels in material annealed for 1 h. Upon annealing, a 10% increase in hardness was observed within the first five minutes, after which the hardness was maintained for long tunes, despite the high volume fraction of large grains. Only after extensive annealing, when the majority of the material was made up of large grains, did the hardness decrease rapidly. The results demonstrate that the hardness is not determined by a law of mixtures but by percolation of the large grains. (C) 2002 IoM Communications Ltd.
引用
收藏
页码:151 / 156
页数:6
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