Effect of substrate roughness on the apparent surface free energy of sputter deposited superhydrophobic polytetrafluoroethylene thin films

被引：31

作者：

Barshilia, Harish C. ^{[1
]}

Mohan, D. Krishna ^{[1
]}

Selvakumar, N. ^{[1
]}

Rajam, K. S. ^{[1
]}

机构：

[1] CSIR, Natl Aerosp Labs, Surface Engn Div, Bangalore 560017, Karnataka, India

来源：

APPLIED PHYSICS LETTERS | 2009年 / 95卷 / 03期

关键词：

contact angle; free energy; polymer films; sputter deposition; surface energy; surface morphology; surface roughness; thin films;

D O I：

10.1063/1.3186079

中图分类号：

O59 [应用物理学];

学科分类号：

070305 [高分子化学与物理];

摘要：

Surface morphology plays an important role in determining the superhydrophobic behavior of solids. To provide insights on the influence of roughness over a wide range, we have carried out a quantitative study of effect of substrate roughness on contact angle and surface free energy (SFE) of sputter deposited superhydrophobic polytetrafluoroethylene thin films. An optimum value for substrate roughness has been derived and a practical methodology (sand blasting) for its fabrication has been proposed. The SFE values were calculated using Zisman method and validated by Fowkes-Girifalco-Good theory.

引用

页数：3

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