Surface sensitivity of very low energy electrons

被引:3
作者
Bartos, I
Schattke, W
机构
[1] Acad Sci Czech Republ, Inst Phys, Prague 16253 6, Czech Republic
[2] Univ Kiel, Inst Theoret Phys, D-24098 Kiel, Germany
关键词
D O I
10.1142/S0218625X99000603
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The surface sensitivity of electron diffraction and of electron spectroscopies is determined by the imaginary component of the electron self-energy. In crystals, the energy and direction dependence of the electron attenuation and of the escape depth should be taken into account at very low energies. Strong anisotropy of the electron attenuation has been obtained around 20 eV from peak shapes in VLEED intensity profiles from (111) transition metal surfaces. Extension of the local density approximation in the density functional formalism provides quantitative description of the electron self-energy. The one-step model of angular resolved photoemission incorporating the self-energy predicts a strong energy and angle dependence of the escape depth of low energy photoelectrons emitted from GaAs(110).
引用
收藏
页码:631 / 633
页数:3
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