Interface governed magnetostriction in ultra thin CoFe and Fe films

被引：3

作者：

Mattheis, R ^{[1
]}

Langer, J ^{[1
]}

Senz, S ^{[1
]}

van den Berg, HAM ^{[1
]}

机构：

[1] Inst Phys High Technol, D-07745 Jena, Germany

来源：

POLYCRYSTALLINE METAL AND MAGNETIC THIN FILMS | 1999年 / 562卷

关键词：

D O I：

10.1557/PROC-562-15

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

Two different types of polycrystalline films, films with low (Fe) and films with high (Co50Fe50) saturation magnetostriction lambda(s) were sandwiched between Cu to study the thickness dependence of lambda(s) in Cu/X/Cu systems. We utilised a new method (ROTMOKE) for a high accurate H-k determination. The values for lambda(s) were determined by analysing the change of H-k during application of compressive and tensile stress by cylindrical bending of the substrate joint with the film. For both systems, a remarkable contribution of the interface to the h, was found. The sign of the interface contribution is opposed to the sign of bulk lambda(s) leading to a zero transition of lambda(s). For Fe this transition occurs at a thickness of 5 nm whereas for the CoFe film with a strong h, value of the bulk of around 80.10(-6) a transition was extrapolated at a thickness around 1 nm.

引用

页码：15 / 20

页数：6

共 9 条

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