Monolayer protection for eletrochemical migration control in silver nanocomposite

被引：22

作者：

Li, Yi ^{[1
]}

Wong, C. P. ^{[1
]}

机构：

[1] Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USA

来源：

APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 11期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1063/1.2353813

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The authors introduced an effective approach of using monolayer-protected silver nanoparticles to reduce silver migration for electronic device interconnect applications. Formation of surface complex between the carboxylate anion and surface silver ion reduces the solubility and diffusivity significantly of migration components and therefore contributes to effective migration control. A fundamental understanding of the mechanism of silver migration control was conducted by studying the current-voltage relationships of the nanocomposites with a migration model. The control of silver migration enables the application of the silver composites in fine pitch and high performance electronic device interconnects. (c) 2006 American Institute of Physics.

引用

页数：3

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