Growth and structure of Cr ultra-thin films deposited on Co(0001)

被引：12

作者：

Ohresser, P

Scheurer, F

Carriere, B

Deville, JP

Dobroiu, A

机构：

[1] INST PHYS & CHIM MAT STRASBOURG,UMR 046,F-67037 STRASBOURG,FRANCE

[2] INST FIZ ATOM,R-76900 BUCHAREST,MAGURELE,ROMANIA

来源：

SURFACE SCIENCE | 1996年 / 352卷

关键词：

chromium; cobalt; epitaxy; growth; magnetic films; surface structure;

D O I：

10.1016/0039-6028(95)01198-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The growth and structure of ultra-thin Cr films deposited on a Co(0001) single crystal are investigated for substrate temperatures ranging from 300 to 500 K by means of Auger electron spectroscopy, low energy electron diffraction and photoemission. For room temperature growth, the interface is sharp and the Cr layers arrange in a Nishiyama-Wassermann-type epitaxy. At elevated temperatures the interface is diffuse and a Kurdjumov-Sachs orientation is observed.

引用

页码：567 / 571

页数：5

共 15 条

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ARGILE C, 1989, SURF SCI REP, V10, P280

[2]

BARBIER A, 1993, THESIS U L PASTEUR

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