Fabrication of patterned high-density polymer graft surfaces. II. Amplification of EB-patterned initiator monolayer by surface-initiated atom transfer radical polymerization

被引：41

作者：

Tsujii, Y ^{[1
]}

Ejaz, M ^{[1
]}

Yamamoto, S ^{[1
]}

Fukuda, T ^{[1
]}

Shigeto, K ^{[1
]}

Mibu, K ^{[1
]}

Shinjo, T ^{[1
]}

机构：

[1] Kyoto Univ, Inst Chem Res, Uji, Kyoto 6110011, Japan

来源：

POLYMER | 2002年 / 43卷 / 13期

关键词：

atom transfer radical polymerization; electron beam lithography; polymer brush;

D O I：

10.1016/S0032-3861(02)00124-6

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Patterned films of a low-polydispersity polymer densely end-grafted on a silicon substrate were fabricated for the first time by the combined use of electron beam (EB) lithography and living radical polymerization; a focused EB was scanned on an initiator-immobilized substrate to selectively bombard and decompose the initiator, and then the EB-induced pattern was amplified by the atom transfer radical polymerization (ATRP) technique using Cu/ligand complexes. Ellipsometric and atomic force microscopic studies indicated that doses sufficiently larger than 2000 muC/cm(2) would completely decompose the monolayer of the initiator, 2-(4-chlorosulfonylphenyl)ethyltrichiorosilane, and that the surface-initiated ATRP could amplify the EB-produced fine pattern of the initiator monolayer. (C) 2002 Elsevier Science Ltd. All rights reserved.

引用

收藏

页码：3837 / 3841

页数：5

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