Nanopatterning via Pressure-Induced Instabilities in Thin Polymer Films

被引：12

作者：

He, Ximin ^{[1
,2
]}

Winkel, Jurjen ^{[3
]}

Huck, Wilhelm T. S. ^{[1
,2
]}

机构：

[1] Univ Cambridge, Dept Chem, Melville Lab Polymer Synth, Cambridge CB2 1EW, England

[2] Univ Cambridge, Nanosci Ctr, Cambridge CB3 0FF, England

[3] Kodak European Res, Cambridge CB4 0WN, England

来源：

ADVANCED MATERIALS | 2009年 / 21卷 / 20期

关键词：

NANOIMPRINT LITHOGRAPHY; RUPTURE;

D O I：

10.1002/adma.200803547

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The residual stresses in spin-coated films can be exploited to produce highly controlled nanoscale patterns via pressure-induced local rupturing and dewetting of thin films. Residue-free holes as small as 28 nm in diameter formed over large areas by pressing sharp stamps into polymer films at temperatures well below the glass transition temperature.

引用

页码：2083 / 2087

页数：5

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