Formation of a continuous mesoporous silica film with fully aligned mesochannels on a glass substrate

被引:120
作者
Miyata, H
Kuroda, K
机构
[1] Canon Inc, R&D Headquarters, Canon Res Ctr, Atsugi, Kanagawa 2430193, Japan
[2] Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
[3] Waseda Univ, Kagami Mem Lab Mat Sci & Technol, Shinjuku Ku, Tokyo 1690051, Japan
关键词
D O I
10.1021/cm990506k
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A continuous mesoporous silica film with uniaxially aligned hexagonal mesochannels was formed on a silica glass substrate using a rubbing-treated thin polyimide coating on the substrate. Polyimide which has a hexamethylene group per the repeating unit: as a part of the main chain was used. The mesostructured silica film was grown on the polyimide-coated substrate through the hydrolysis of tetraethoxysilane under acidic conditions in the presence of hexadecyltrimethylammonium chloride. X-ray diffraction experiments show that the hexagonal mesochannels in the film run parallel to the substrate surface and are aligned normal to the rubbing direction with a very narrow distribution of +/-6 degrees. The hexagonal arrangement of the mesochannels over the whole film thickness was proved by cross-sectional transmission electron microscopy. This highly preferred alignment of the mesochannels is caused by strong interactions between the surfactant tail groups and the polymer chains.
引用
收藏
页码:49 / 54
页数:6
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