Low energy broad beam electron gun

被引：6

作者：

Barefoot, TW

Ebinger, HD

Yates, JT

机构：

[1] Surface Science Center, Department of Chemistry, University of Pittsburgh, Pittsburgh

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1997年 / 15卷 / 05期

关键词：

D O I：

10.1116/1.580948

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A low-energy electron gun for the energy range of 5-100 eV providing a uniform and high electron flux over a circular surface area of several cm(2) has been designed and tested. Focusing elements allow one to vary the beam diameter according to experimental needs. The uniform current densities make it suitable for the study of electron stimulated surface chemistry and thin-film production. (C) 1997 American Vacuum Society.

引用

页码：2740 / 2742

页数：3

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