Aluminum oxynitride coatings for oxidation resistance of epoxy films

被引：20

作者：

Ianno, NJ

Enshashy, H

Dillon, RO

机构：

[1] Univ Nebraska, Ctr Microelect & Opt Mat Res, Lincoln, NE 68588 USA

[2] Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 155卷 / 2-3期

关键词：

atomic force microscopy; X-ray diffraction; reactive sputtering; nitrides oxides; aluminum;

D O I：

10.1016/S0257-8972(02)00051-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Aluminum nitride (AlN) and aluminum oxynitride (AlNO) films were sputter deposited onto epoxy coated silicon substrates. The films were characterized by: electron microscopy; atomic force microscopy: theta-2theta X-ray diffractometry; and profilometry. The surface morphology of the films was a function of the feed gas oxygen content. Amorphous aluminum oxynitride films formed with oxygen flows of more than 0.5 seem yielded smooth, continuous coatings over the epoxy. The oxynitride/epoxy/silicon structure was exposed in an electron cyclotron resonance low Earth orbit simulator, and showed 2-3 nm roughening up to the maximum fluence of 2.4 x 10(22) atoms/cm(2). This is equivalent to 94-940 days in low Earth orbit, depending on orbit height. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：130 / 135

页数：6

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