Combination of surface characterization techniques for investigating optical thin-film components

被引：24

作者：

Duparre, A

Jakobs, S

机构：

[1] Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, D-07745

来源：

APPLIED OPTICS | 1996年 / 35卷 / 25期

关键词：

light scattering; thin-film microstructure; atomic force microscopy; surface roughness;

D O I：

10.1364/AO.35.005052

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

To meet the requirements of comprehensively characterizing the morphology of thin films and substrates, a suitable combination of different measuring techniques should be chosen, i.e., a nonoptical surface profile measurement should be used together with optical analysis. It is demonstrated on selected examples of fluoride and oxide films that the use of atomic force microscopy and light scattering fulfills the demand of appropriate quantitative characterization over a sufficiently large range of bandwidths. (C) 1996 Optical Society of America

引用

页码：5052 / 5058

页数：7

共 18 条

[1]

Amra C, 1994, P SOC PHOTO-OPT INS, V2253, P614

[2]

Bennett J.M., 1989, INTRO SURFACE ROUGHN

[3]

Bennett J. M., 1992, SURFACE FINISH ITS M, V2

[4] RELATIONSHIP BETWEEN SURFACE SCATTERING AND MICROTOPOGRAPHIC FEATURES [J].

CHURCH, EL ;

JENKINSON, HA ;

ZAVADA, JM .

OPTICAL ENGINEERING, 1979, 18 (02) :125-136

[5]

DUPARRE A, 1995, THIN SOLID FILMS, V261, P70

[6]

Duparre A., 1995, THIN FILMS OPTICAL C, V1, P273

[7]

DUPARRE A, 1992, APPL OPTICS, V32, P5475

[8]

DUPARRE A, 1994, P SOC PHOTO-OPT INS, V2253, P1069

[9]

DUPARRE A, 1996, REV LASER ENG JPN, V26, P68

[10]

FEIGL T, 1995, THESIS U JENA JENA G

← 1 2 →