Dip-Pen-Nanolithographic Patterning of Metallic, Semiconductor, and Metal Oxide Nanostructures on Surfaces

被引:105
作者
Basnar, Bernhard [1 ]
Willner, Itamar [2 ]
机构
[1] Vienna Univ Technol, Ctr Micro & Nanostruct, A-1040 Vienna, Austria
[2] Hebrew Univ Jerusalem, Inst Chem, IL-91904 Jerusalem, Israel
基金
以色列科学基金会;
关键词
atomic force microscopy; dip-pen nanolithography; monolayers; nanoparticles; nanopatterning; ATOMIC-FORCE MICROSCOPE; SCANNING PROBE LITHOGRAPHY; ENHANCED INFRARED-SPECTROSCOPY; DPN-GENERATED NANOSTRUCTURES; SELF-ASSEMBLED MONOLAYERS; GOLD NANOPARTICLES; MOLECULAR-TRANSPORT; CARBON NANOTUBES; AQUEOUS-SOLUTION; HYBRID SYSTEMS;
D O I
10.1002/smll.200800583
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Dip-pen nanolithography (DPN) is a powerful method to pattern nanostructures on surfaces by the controlled delivery of an "ink" coating the tip of an atomic force microscope upon scanning and contacting with surfaces. The growing interest in the use of nanoparticles as structural and functional elements for the fabrication of nanodevices suggests that the DPN-stimulated patterning of nanoparticles on surfaces might be a useful technique to assemble hierarchical architectures Of nanoparticles that could pave methodologies for functional nanocircuits or nanodevices. This Review presents different methodologies for the nanolithographic patterning of metallic, semi. conductor, and metal oxide nanostructures on surfaces. The mechanisms involved in the formation of the nanostructures are discussed and the effects that control the dimensions of the resulting patterns are reviewed. The possible applications of the nanostructures are also addressed.
引用
收藏
页码:28 / 44
页数:17
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