Plasma-induced surface segregation and oxidation in nickel-iron thin films

被引：8

作者：

Hsiao, R ^{[1
]}

Mauri, D ^{[1
]}

机构：

[1] IBM Corp, Div Res, Almaden Res Ctr, San Jose, CA 95193 USA

来源：

APPLIED SURFACE SCIENCE | 2000年 / 157卷 / 03期

关键词：

surface segregation; oxygen plasma; high-density plasma; NiFe film;

D O I：

10.1016/S0169-4332(99)00571-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Plasma-induced surface segregation and oxidation of Fe in nickel-iron (NiFe) thin films have been investigated. Reactive species in an oxygen plasma are found to be the driving force for Fe surface segregation and oxidation. Mapping of the film optical density change as a function of plasma exposure conditions indicates that segregation and oxidation are accelerated dramatically by the presence of reactive radicals and ion bombardment. For plasma oxidation protection, tantalum is found to be a more effective capping layer than tantalum oxide. With a tantalum capping layer, NiFe films maintain their magnetic properties until the tantalum capping layer is completely oxidized. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：185 / 190

页数：6

共 14 条

[1] BOND AND STRAIN-ENERGY EFFECTS IN SURFACE SEGREGATION - ATOMIC CALCULATION [J].

ABRAHAM, FF ;

TSAI, NH ;

POUND, GM .

SURFACE SCIENCE, 1979, 83 (02) :406-422

[2]

Chattopadhyay B., 1970, Oxidation of Metals, V2, P373, DOI [10.1007/BF00604477, DOI 10.1007/BF00604477, 10.1007/BF00604477.pdf, DOI 10.1007/BF00604477.PDF]

[3] PREDICTIONS FOR SURFACE SEGREGATION IN INTERMETALLIC ALLOYS [J].

CHELIKOWSKY, JR .

SURFACE SCIENCE, 1984, 139 (2-3) :L197-L203

[4]

Gibbs J. W., 1957, COLLECTED WORKS, V1

[5] Response surface study of resist etching in high density oxygen plasma and interactions of O-2 plasma with NiFe, Cu, Ta, and Al2O3 [J].

Hsiao, R ;

Miller, D ;

Kellock, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03) :1028-1032

[6]

KELLER JH, 1993, J VAC SCI TECHNOL A, V11, P2478

[7] Oxidation Studies of Permalloy Films by Quartz Crystal Microbalance, AES, and XPS [J].

Lee, Wen-Yaung ;

Eldridge, Jerome .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) :1747-1751

[8] EFFECTS OF OXIDATION ON THE ATMOSPHERIC CORROSION OF PERMALLOY-FILMS [J].

LEE, WY ;

SCHERER, G ;

GUARNIERI, CR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (09) :1533-1539

[9]

MCLEAN D, 1957, GRAIN BOUNDARIES MET, pCH5

[10]

MIEDEMA AR, 1978, Z METALLKD, V69, P287

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