Lifetime testing of EUV optics using intense synchrotron radiation at the PTB Radiometry Laboratory

被引：15

作者：

Klein, R ^{[1
]}

Gottwald, A ^{[1
]}

Scholze, F ^{[1
]}

Thornagel, R ^{[1
]}

Tümmler, J ^{[1
]}

Ulm, G ^{[1
]}

Wedowski, M ^{[1
]}

Stietz, F ^{[1
]}

Mertens, B ^{[1
]}

Koster, N ^{[1
]}

van Elp, J ^{[1
]}

机构：

[1] Phys Tech Bundesanstalt, D-10587 Berlin, Germany

来源：

SOFT X-RAY AND EUV IMAGING SYSTEMS II | 2001年 / 4506卷

关键词：

extreme ultraviolet lithography; EUV optics; surface contamination; multilayer mirrors; synchrotron radiation; reflectometry;

D O I：

10.1117/12.450950

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Degradation of EUV optics during irradiation is a crucial topic as regards lifetime and performance in EUV lithography. To simulate irradiation conditions for future lithography tools, PTB (the German national metrology institute) operates two dedicated beamlines at the electron storage ring BESSY H. Both, undispersed undulator radiation from an EUV optimized undulator as well as focused and filtered bending magnet radiation can be used. Both beamlines provide EUV radiation with power densities of several mW/mm(2). A dedicated irradiation chamber with sample load lock and differential pumping allows components such as substrates, multilayer mirrors or filters to be exposed to EUV radiation under different vacuum conditions. At the same laboratory, high-accuracy EUV reflectometry can be performed for proximate assessment of the resulting performance.

引用

页码：105 / 112

页数：8

共 7 条

[1] RADIATION HARDNESS OF MOLYBDENUM SILICON MULTILAYERS DESIGNED FOR USE IN A SOFT-X-RAY PROJECTION LITHOGRAPHY SYSTEM
GAINES, DP
SPITZER, RC
CEGLIO, NM
KRUMREY, M
ULM, G
[J]. APPLIED OPTICS, 1993, 32 (34): : 6991 - 6998
[2] KLEBANOFF LE, 2000, 2 ANN INT WORKSH EUV
[3] The PTB electromagnetic undulator for BESSY II
Klein, R
Bahrdt, J
Herzog, D
Ulm, G
[J]. JOURNAL OF SYNCHROTRON RADIATION, 1998, 5 : 451 - 452
[4] OESTREICH S, 2000, P SOC PHOTO-OPT INS, V4146, P6
[5] The new PTB beamlines for high-accuracy EUV reflectometry at BESSY II
Scholze, F
Beckhoff, B
Brandt, G
Fliegauf, R
Klein, R
Meyer, B
Rost, D
Schmitz, D
Veldkamp, M
Weser, J
Ulm, G
Louis, E
Yakshin, AE
Oestreich, S
Bijkerk, F
[J]. SOFT X-RAY AND EUV IMAGING SYSTEMS, 2000, 4146 : 72 - 82
[6] The PTB radiometry laboratory at the BESSY II electron storage ring
Ulm, G
Beckhoff, B
Klein, R
Krumrey, M
Rabus, H
Thornagel, R
[J]. X-RAY OPTICS, INSTRUMENTS, AND MISSIONS, 1998, 3444 : 610 - 621
[7] Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
Wedowski, M
Bajt, S
Folta, JA
Gullikson, EM
Kleineberg, U
Klebanoff, LE
Malinowski, ME
Clift, WM
[J]. EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES, 1999, 3767 : 217 - 224

← 1 →