Dissociative attachment to excited SF6:: selective IR excitation versus thermal activation

被引:23
作者
Rosa, A
Brüning, F
Kumar, SVK
Illenberger, E
机构
[1] Tata Inst Fundamental Res, PAM Lab, Bombay 400005, Maharashtra, India
[2] Free Univ Berlin, Inst Chem Phys & Theoret Chem, D-14195 Berlin, Germany
关键词
D O I
10.1016/j.cplett.2004.05.007
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Vibrational excitation of the v(3) mode of SF6 by a CO2 laser, followed by electron attachment, leads to a very sharp enhancement in the dissociative electron attachment (DEA) process SF5- + F at 0 eV electron energy, but does not affect the intensity of the metastable SF6-. This is in striking contrast to thermal heating where SF5- is enhanced within a broad electron energy range and the SF6 intensity strongly decreases. In the framework of localized potential energy surfaces the effect of the v(3) mode for the DEA reaction at 0 eV is explained by the level of the curve crossing between the neutral and anionic system matching the energy of the v(3) vibration. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:361 / 365
页数:5
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