On the nanocrystalline structure of TiC and TiB2 produced by laser ablation

被引：9

作者：

Zergioti, I ^{[1
]}

Haidemenopoulos, GN ^{[1
]}

机构：

[1] UNIV THESSALY,DEPT MECH & IND ENGN,VOLOS 38334,GREECE

来源：

NANOSTRUCTURED MATERIALS | 1997年 / 8卷 / 01期

关键词：

D O I：

10.1016/S0965-9773(97)81417-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of TiC and TiB2 have been deposited on silicon substrate by pulsed laser deposition technique, under substrate temperatures 25 - 600 degrees C. Transmission electron microscopy revealed the nanocrystalline structure of the coatings. The grain size for the TiC film was between 10 and 70 nm and for the TiB2 film was between 10 and 50 nm.

引用

页码：55 / 59

页数：5

共 9 条

[1]

BAUER AD, 1991, J PHYS IV, V1, P641

[2]

Chrisey D. B., 1994, PULSED LASER DEPOSIT

[3]

COURTOIS C, 1991, J PHYS IV, V1, P657

[4]

GOTO T, 1992, J MATER SCI, V27, P233, DOI 10.1007/BF02403668

[5] MATERIAL SELECTION FOR HARD COATINGS [J].

HOLLECK, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2661-2669

[6]

MUKAIDA M, 1991, J MATER SCI, V26, P6613, DOI 10.1007/BF02402653

[7] GROWTH OF TIC THIN-FILMS BY PULSED LASER EVAPORATION [J].

RIST, O ;

MURRAY, PT .

MATERIALS LETTERS, 1991, 10 (7-8) :323-328

[8] TRIBOLOGICAL BEHAVIOR OF TIC THIN-FILMS GROWN BY PULSED LASER DEPOSITION (PLD) [J].

SESSLER, WJ ;

DONLEY, MS ;

ZABINSKI, JS ;

WALCK, SD ;

DYHOUSE, VJ .

SURFACE & COATINGS TECHNOLOGY, 1993, 56 (02) :125-130

[9]

ZERGIOTI I, 1996, UNPB TSF

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