Photostability of pyrromethene 567 doped in ORMOSILs with various additives

被引：16

作者：

Yang, Y ^{[1
]}

Qian, GD ^{[1
]}

Su, DL ^{[1
]}

Wang, MQ ^{[1
]}

机构：

[1] Zhejiang Univ, State Key Lab Silicon Mat, Dept Mat Sci & Engn, Hangzhou 310027, Peoples R China

来源：

OPTICS COMMUNICATIONS | 2004年 / 239卷 / 4-6期

基金：

中国国家自然科学基金;

关键词：

ORMOSILs; pyrromethene; 567; photostability; photo-stable additive;

D O I：

10.1016/j.optcom.2004.05.053

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this work, laser dye pyrromethene 567 (p567) was doped into methyltriethoxysilane (MTES)-derived organically modified silicate (ORMOSIL) monolith with various photo-stable additives including 1,4-diazobicyclo[2,2,2]octane (DABCO), 2,2,6,6-tetramethylpiperdin (TMP) and coumarin 440 (C440). The photostability of p567 was determined under continuous ultraviolet irradiation and its dependence on the concentration of each additive was studied. The results illustrated that the photostability of p567 in ORMOSIL with the optimized concentration of DABCO or TMP was improved by at least 100%. The highest photostability of p567 was obtained with the presence of C440, where at least four times of improvement has been observed. The photo-stable mechanisms of additives have also been discussed. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：415 / 420

页数：6

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