Large magnetotunneling effect at low magnetic fields in micrometer-scale epitaxial La0.67Sr.033MnO3 tunnel junctions

被引:383
作者
Lu, Y
Li, XW
Gong, GQ
Xiao, G
Gupta, A
Lecoeur, P
Sun, JZ
Wang, YY
Dravid, VP
机构
[1] IBM CORP, DIV RES, TJ WATSON RES CTR, YORKTOWN HTS, NY 10698 USA
[2] NORTHWESTERN UNIV, DEPT MAT SCI & ENGN, EVANSTON, IL 60208 USA
关键词
D O I
10.1103/PhysRevB.54.R8357
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have used a self-aligned lithographic process to fabricate magnetic tunnel junctions of La0.67Sr0.33MnO3 down to a few micrometers in size. We have obtained a magnetoreistance ratio as large as 83% at low magnetic fields of a few tens of Oe, which correspond to the coercivities of the magnetic layers. Transmission-electron-microscopy analysis has revealed the heteroepitaxial growth of the trilayer junction structure, La0.67Sr0.33MnO3/SrTiO3/La0.67Sr0.33MnO3. We have observed current-voltage characteristics typical of electron tunneling across an insulating barrier. The large magnetoresistance is likely due to the nearly half-metallic electronic structure of the manganites.
引用
收藏
页码:R8357 / R8360
页数:4
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