Two-stage design method for realization of photonic bandgap structures with desired symmetries by interference lithography

被引：14

作者：

Ao, XY ^{[1
]}

He, SL

机构：

[1] Zhejiang Univ, Joint Res Ctr Photon, Royal Inst Technol, Hangzhou 310027, Peoples R China

[2] Zhejiang Univ, State Key Lab Modern Opt Instrumentat, Ctr Opt & Electromagnet Res, Hangzhou 310027, Peoples R China

[3] Royal Inst Technol, Dept Microelect & Informat Technol, Lab Photon & Microwave Engn, SE-16440 Kista, Sweden

来源：

OPTICS EXPRESS | 2004年 / 12卷 / 06期

关键词：

D O I：

10.1364/OPEX.12.000978

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Interference lithography for the fabrication of photonic crystals is considered. A two-stage design method for realization of photonic bandgap structures with desired symmetries is developed. An optimal photonic crystal with a large bandgap is searched by adjusting some parameters while keeping some basic symmetry of the unit cell unchanged. A nonlinear programming method is then used to find the optimal electric field vectors of the laser beams and realize the desired interference pattern. The present method is useful for a rational and systematical design of new photonic bandgap structures. (C) 2004 Optical Society of America.

引用

页码：978 / 983

页数：6

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