Application of optical filters fabricated by masked ion beam lithography

被引：35

作者：

Morgan, MD

Horne, WE

Sundaram, V

Wolfe, JC

Pendharkar, SV

Tiberio, R

机构：

[1] UNIV HOUSTON,HOUSTON,TX 77204

[2] CORNELL UNIV,CORNELL NANOFABRICAT FACIL,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期

关键词：

D O I：

10.1116/1.588691

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Masked ion beam lithography (MIBL) was employed to fabricate optical filters as a critical component of an energy conversion system which utilizes semiconductor photovoltaics. This article will describe the operation and novel application of these devices and the MIBL pilot production line being facilitized. The conversion concept, thermophotovoltaics (TPV), when coupled with these MIBL produced bandpass filters, is capable of converting heat to electrical power with >20% conversion efficiency. The EDTEK TPV filter is based on a high density array of slotted antenna elements patterned into a single layer of thin gold film. (C) 1996 American Vacuum Society.

引用

页码：3903 / 3906

页数：4