Two-dimensional polymer nanopattern by using particle-assisted soft lithography

被引：40

作者：

Choi, DG ^{[1
]}

Jang, SG ^{[1
]}

Yu, HK ^{[1
]}

Yang, SM ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Chem & Biomol Engn, Taejon 305701, South Korea

来源：

CHEMISTRY OF MATERIALS | 2004年 / 16卷 / 18期

关键词：

D O I：

10.1021/cm034892o

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this work, we fabricated a designed 2D polymer pattern by embossing and replica molding using colloidal stamps that were prepared from self-assembled particle arrays in a soft, patterned PDMS mold. For a successful pattern transfer, polymer infiltration at the interstices between the silica spheres of the colloidal stamp was controlled by depositing a thin gold layer.

引用

页码：3410 / 3413

页数：4

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