Beam-induced effects in soft X-ray photoelectron emission microscopy experiments

被引：27

作者：

Gregoratti, L. ^{[1
]}

Mentes, T. O. ^{[1
]}

Locatelli, A. ^{[1
]}

Kiskinova, M. ^{[1
]}

机构：

[1] Sincrotrone Trieste ScPA, I-34012 Trieste, Italy

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2009年 / 170卷 / 1-3期

关键词：

Photoelectron spectroscopy; Photoemission microscopy; X-ray damage; ELECTRON-STIMULATED DESORPTION; SPECTROSCOPY; FILMS; OXIDE; CHEMISTRY;

D O I：

10.1016/j.elspec.2008.09.003

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The beam-induced effects, a consequence of the high photon flux density used in soft X-ray photoelectron emission microscopes in operation at the 3rd generation synchrotron sources, are discussed and illustrated using some representative results obtained with the microscopes at the laboratory Elettra. The focus is on the photon-induced charge potential and chemical degradation, which might be a severe problem for photon-sensible specimens. The possible steps to avoid, reduce or even make use of the beam-induced effects are outlined. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：13 / 18

页数：6

共 31 条

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Atwood D., 1999, SOFT XRAYS EXTREME U

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