CNx thin films obtained by laser induced CVD in different gas-substrate systems

被引：17

作者：

Alexandrescu, R ^{[1
]}

Cireasa, R ^{[1
]}

Pugna, G ^{[1
]}

Crunteanu, A ^{[1
]}

Petcu, S ^{[1
]}

Morjan, I ^{[1
]}

Mihailescu, IN ^{[1
]}

Andrei, A ^{[1
]}

机构：

[1] INST NUCL REACTORS, PITESTI, ROMANIA

来源：

APPLIED SURFACE SCIENCE | 1997年 / 109卷

关键词：

D O I：

10.1016/S0169-4332(96)00632-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The possibility to deposit CNx thin films by laser-induced CVD technique was investigated. For this purpose, different carbon/nitrogen containing mixtures and substrates were used. CO2 and the KrF laser irradiations were employed. The deposition was alternatively performed on laser pre-deposited catalytic titanium thin films and on bare substrates (quartz and alumina). An XPS analysis of CNx film composition reveals that in the presence of Ti layers nitrogen incorporation is enhanced and chemical structures with higher transfer states are favored.

引用

页码：544 / 548

页数：5

共 16 条

[1]

Alexandrescu R., 1995, Advanced Materials for Optics and Electronics, V5, P19, DOI 10.1002/amo.860050105

[2] FORMATION OF CARBON NITRIDE FILMS ON SI(100) SUBSTRATES BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ASSISTED VAPOR-DEPOSITION [J].