Unstable epitaxy on vicinal surfaces

被引:102
作者
Rost, M
Smilauer, P
Krug, J
机构
[1] FORSCHUNGSZENTRUM JULICH, FORSCHUNGSZENTRUM, HOCHSTLEISTUNGSRECHENZENTRUM, D-52425 JULICH, GERMANY
[2] UNIV ESSEN GESAMTHSCH, FACHBEREICH PHYS, D-45117 ESSEN, GERMANY
关键词
computer simulations; growth; models of surface kinetics; molecular beam epitaxy; surface diffusion; surface structure; morphology; roughness; and topography; vicinal single crystal surfaces;
D O I
10.1016/S0039-6028(96)00905-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Epitaxial growth on a vicinal surface in the step how regime, where the diffusion length exceeds the step spacing, is studied by simulation of a continuum equation and a solid-on-solid model. Such a surface is known to undergo a meandering instability if step edge barriers suppress downward interlayer transport. We show that the resulting ripple pattern is itself unstable, and evolves at long times into an essentially isotropic mound morphology which is qualitatively and quantitatively indistinguishable from that obtained on singular surfaces.
引用
收藏
页码:393 / 402
页数:10
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