Wavelength-dispersive total-reflection X-ray fluorescence with an efficient Johansson spectrometer and an undulator X-ray source:: Detection of 10-16 g-level trace metals

The present paper reports significant enhancement of the detection power for total-reflection X-ray fluorescence). The employment of an efficient wavelength-dispersive spectrometer rather than a conventional Si(Li) detector, as well as the use of a quasi-monochromatic undulator X-ray source, completely changed the quality of X-ray florescence spectra. The energy resolution is 20 times better, which effectively contributes to reducing the low-energy tail of the scattering background and to separating neighboring X-ray florescence peaks. Another advantage is its capability with respect to high-counting-rate measurements, which ensure the detection of weak signals from trace materials. The absolute and relative detection limit for nickel are 3.1 x 10(-16) g and 3.1 ppt (pg/g) for a 0.1-muL droplet of pure water, respectively, which is nearly 50 times better than the current best data achieved by conventional energy-dispersive TXRF using a Si(Li) detector system.