Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas

被引：35

作者：

Booth, JP ^{[1
]}

Cunge, G ^{[1
]}

Biennier, L ^{[1
]}

Romanini, D ^{[1
]}

Kachanov, A ^{[1
]}

机构：

[1] Univ Grenoble 1, Spectrometrie Phys Lab, F-38402 St Martin Dheres, France

来源：

CHEMICAL PHYSICS LETTERS | 2000年 / 317卷 / 06期

关键词：

D O I：

10.1016/S0009-2614(99)01424-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Many reactive species of interest in technological plasmas absorb light in the UV spectral region (200-300 nm). Measurement of these weak absorbances (typically 10(-2)-10(-4) for a single pass) allows us to determine their absolute concentration. Low-resolution absorption spectra of these systems have previously been obtained by broad-band absorption spectroscopy. Here we present spectra obtained using laser cavity ring-down spectroscopy, which has much higher spectral resolution, and potentially higher sensitivity. Spectra were obtained for CF, CF2, AlF and SiF2 radicals in capacitively-coupled radio-frequency plasmas in fluorocarbon gases. This technique offers the possibility of real-time (1 s) absolute concentration measurements during wafer processing. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：631 / 636

页数：6

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