The production of thermal plasma

被引：7

作者：

Fauchais, P

Coudert, JF

Pateyron, B

机构：

来源：

REVUE GENERALE DE THERMIQUE | 1996年 / 35卷 / 416期

关键词：

D O I：

10.1016/S0035-3159(99)80081-6

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

引用

页码：543 / 560

页数：18

共 122 条

[1]

Amourox J., 1992, HIGH TEMP CHEM PROCE, V1, P537

[2]

ARSAOUI A, 1995, P 3 THERM PLASM PROC, P229

[3] PLASMA CUTTING IN ATMOSPHERE AND UNDER WATER [J].

BACH, W ;

GRUCHOW, A .

PURE AND APPLIED CHEMISTRY, 1992, 64 (05) :665-670

[4]

Bebber H, 1994, HIGH TEMP CHEM PROCE, V3, P665

[5] MODELING OF PARTICLES IMPACTING ON A RIGID SUBSTRATE UNDER PLASMA SPRAYING CONDITIONS [J].

BERTAGNOLLI, M ;

MARCHESE, M ;

JACUCCI, G .

JOURNAL OF THERMAL SPRAY TECHNOLOGY, 1995, 4 (01) :41-49

[6]

BIANCHI L, 1995, J THERM SPRAY TECHN, V4, P59, DOI 10.1007/BF02648529

[7]

BOSWELL PG, 1979, MET FORUM, V2, P40

[8] THE INDUCTIVELY COUPLED RF (RADIO-FREQUENCY) PLASMA [J].

BOULOS, MI .

PURE AND APPLIED CHEMISTRY, 1985, 57 (09) :1321-1352

[9]

BOUMANS P, 1986, ANAL INDUCTIVELY COU

[10] STUDY OF THE DYNAMIC AND STATIC BEHAVIOR OF DC VORTEX PLASMA TORCHES .2. WELL-TYPE CATHODE [J].

BRILHAC, JF ;

PATEYRON, B ;

COUDERT, JF ;

FAUCHAIS, P ;

BOUVIER, A .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 1995, 15 (02) :257-277

← 1 2 3 4 5 6 7 8 9 10 →