Reactive accelerated cluster erosion (RACE)

被引：10

作者：

Gspann, J ^{[1
]}

机构：

[1] KERNFORSCHUNGSZENTRUM KARLSRUHE GMBH,INST MIKROSTRUKTURTECH,D-76021 KARLSRUHE,GERMANY

来源：

SURFACE REVIEW AND LETTERS | 1996年 / 3卷 / 01期

关键词：

D O I：

10.1142/S0218625X96001613

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Beams of ionized clusters of some thousand atoms are accelerated to about 100-keV kinetic energy to be used for area selective surface erosion. Mask projective cluster-impact lithography allows surface structuring in the submicron regime. Chemical reactions between the cluster and the target material may provide volatile reaction products facilitating ejecta removal. The reactive accelerated cluster erosion (RACE) process is applied to metals like copper and gold, to semiconductors such as silicon, and to insulators like glass, quartz, or sapphire, giving very smooth eroded surface and steep sidewalls.

引用

页码：897 / 900

页数：4