Diamond thin films: a 21st-century material

被引:575
作者
May, PW [1 ]
机构
[1] Univ Bristol, Sch Chem, Bristol BS8 1TS, Avon, England
来源
PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES | 2000年 / 358卷 / 1766期
关键词
review; diamond; chemical vapour deposition; thin film; hard coatings; semiconductor;
D O I
10.1098/rsta.2000.0542
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Diamond has some of the most extreme physical properties of any material, yet its practical use in science or engineering has been limited due its scarcity and expense. With the recent development of techniques for depositing thin films of diamond on a variety of substrate materials, we now have the ability to exploit these superlative properties in many new and exciting applications. In this paper, we shall explain the basic science and technology underlying the chemical vapour deposition of diamond thin films, and show how this is leading to the development of diamond as a 21st century engineering material.
引用
收藏
页码:473 / 495
页数:23
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