Design, fabrication, and characterization of thermally actuated probe Arrays for dip pen nanolithography

被引:42
作者
Bullen, D [1 ]
Wang, XF
Zou, J
Chung, SW
Mirkin, CA
Liu, C
机构
[1] Univ Illinois, Micro & Nanotechnol Lab, Micro Actuators Sensors & Syst Grp, Urbana, IL 61801 USA
[2] Northwestern Univ, Inst Nanotechnol, Evanston, IL 60208 USA
[3] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
atomic force microscope; Dip Pen Nanolithography (DPN); nanolithography; simulation; thermal actuator;
D O I
10.1109/JMEMS.2004.828738
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In Dip Pen Nanolithography (DPN), arbitrary nanoscale chemical patterns can be created by the diffusion of chemicals from the tip of an atomic force microscope (AFM) probe to a surface. This paper describes the design, optimization, fabrication, and testing of an actuated multi-probe DPN array. The probe array consists of 10 thermal bimorph active probes made of silicon nitride and gold. The probes are 300 mum long and the tips are spaced 100 mum apart. An actuation current of 10 mA produces a tip deflection of 8 pm, which is enough to remove individual tips from the surface independent of the adjacent probes. An analytical probe model is presented and used to optimize the design against several possible failure modes. The array is demonstrated by using it to simultaneously write 10 unique octadecanethiol patterns on a gold surface. Pattern linewidth as small as 80 nm has been created at a maximum write speed of 20 mum/sec. By writing multiple, distinctly different patterns in parallel, this device provides a significant improvement in throughput and flexibility over conventional AFM probes in the DPN process.
引用
收藏
页码:594 / 602
页数:9
相关论文
共 29 条
[1]  
Bhushan B., 1999, Principles and Applications of Tribology
[2]   Thermo-mechanical optimization of thermally actuated cantilever arrays [J].
Bullen, D ;
Zhang, M ;
Liu, C .
SMART STRUCTURES AND MATERIALS 2002: SMART ELECTRONICS, MEMS, AND NANOTECHNOLOGY, 2002, 4700 :288-295
[3]   Optimization of a low-stress silicon nitride process for surface-micromachining applications [J].
French, PJ ;
Sarro, PM ;
Mallee, R ;
Fakkeldij, EJM ;
Wolffenbuttel, RF .
SENSORS AND ACTUATORS A-PHYSICAL, 1997, 58 (02) :149-157
[4]   A new method for measuring thermal conductivity of thin films [J].
Govorkov, S ;
Ruderman, W ;
Horn, MW ;
Goodman, RB ;
Rothschild, M .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1997, 68 (10) :3828-3834
[5]   THE EFFECTIVE TRANSVERSE THERMAL-CONDUCTIVITY OF AMORPHOUS SI3N4 THIN-FILMS [J].
GRIFFIN, AJ ;
BROTZEN, FR ;
LOOS, PJ .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (07) :4007-4011
[6]   Measuring local thermal conductivity in polycrystalline diamond with a high resolution photothermal microscope [J].
Hartmann, J ;
Voigt, P ;
Reichling, M .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (07) :2966-2972
[7]   Multiple ink nanolithography: Toward a multiple-pen nano-plotter [J].
Hong, SH ;
Zhu, J ;
Mirkin, CA .
SCIENCE, 1999, 286 (5439) :523-525
[8]   CAPILLARY BINDING FORCE OF A LIQUID BRIDGE [J].
HOTTA, K ;
TAKEDA, K ;
IINOYA, K .
POWDER TECHNOLOGY, 1974, 10 (4-5) :231-242
[9]   ON THE INTRINSIC STRESS IN THIN CHROMIUM FILMS [J].
JANDA, M .
THIN SOLID FILMS, 1986, 142 (01) :37-45
[10]   Self-assembly of ink molecules in dip-pen nanolithography: A diffusion model [J].
Jang, JY ;
Hong, SH ;
Schatz, GC ;
Ratner, MA .
JOURNAL OF CHEMICAL PHYSICS, 2001, 115 (06) :2721-2729