Edge spreading lithography and its application to the fabrication of mesoscopic gold and silver rings

被引：175

作者：

McLellan, JM ^{[1
]}

Geissler, M ^{[1
]}

Xia, YN ^{[1
]}

机构：

[1] Univ Washington, Dept Chem, Seattle, WA 98195 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 126卷 / 35期

关键词：

D O I：

10.1021/ja0470766

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new form of edge lithography, edge spreading lithography (ESL), has been demonstrated and applied to the formation of coinage metal rings. In this process, alkanethiols are delivered from a flat PDMS stamp to the surface of a metal film through a two-dimensional array of spherical silica colloids. The thiols further spread on the metal surface, forming highly ordered SAMs in the form of a ring pattern. Following lift-off of beads, the pattern in the SAMs can be transferred into the metal film through wet chemical etching, with SAMs serving as the resist. The dimensions of the rings can be readily controlled by several parameters such as the beads diameter, the concentration of the thiol solution, and the contact time between the stamp and the silica beads. Copyright © 2003 American Chemical Society.

引用

页码：10830 / 10831

页数：2

共 27 条

[1] Patterned colloidal deposition controlled by electrostatic and capillary forces [J].