Electrowetting on superhydrophobic SU-8 patterned surfaces

被引：90

作者：

Herbertson, Dale L. ^{[1
]}

Evans, Carl R. ^{[1
]}

Shirtcliffe, Neil J. ^{[1
]}

McHale, Glen ^{[1
]}

Newton, Michael I. ^{[1
]}

机构：

[1] Nottingham Trent Univ, Sch Biomed & Nat Sci, Nottingham NG11 8NS, England

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 2006年 / 130卷

基金：

英国工程与自然科学研究理事会;

关键词：

electrowetting; SU-8; superhydrophobic; Wenzel; Cassie-Baxter;

D O I：

10.1016/j.sna.2005.12.018

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Electrowetting on micro-patterned layers of SU-8 photoresist with an amorphous Teflon (R) coating has been observed. The cosine of the contact angle is shown to be proportional to the square of the applied voltage for increasing bias. However, this does not apply below 40 V and we suggest that this may be explained in terms of penetration of fluid into the pattern of the surface. Assuming that the initial application of a bias voltage converts the drop from Cassie-Baxter to Wenzel regime, we have used this as a technique to estimate the roughness factor of the surface. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：189 / 193

页数：5

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