Terahertz waveguide components fabricated using a 3D x-ray microfabrication technique

被引：14

作者：

Moon, SW

Mann, CM

Maddison, BJ

Turcu, ICE

Allot, R

Huq, SE

Lisi, N

机构：

[1] Rutherford Appleton Laboratory, Didcot, Oxfordshire

[2] Korea Adv. Inst. Sci. and Technol., Cheongyang, Seoul 130-650

来源：

ELECTRONICS LETTERS | 1996年 / 32卷 / 19期

关键词：

x-ray lithography; optical waveguides; waveguides;

D O I：

10.1049/el:19961166

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel process using embedded x-ray masks that allows the fabrication of 3D terahertz waveguide components is demonstrated. X-rays produced by a laser plasma source are used to expose a chenically amplified resist. To produce structures with the required depth (similar to 50 mu m) a cyclic exposure and development technique is used. A representative waveguide cavity intended for operation at 2.5THz is realised.

引用

页码：1794 / 1795

页数：2