Studies of amorphous carbon using X-ray photoelectron spectroscopy, near-edge X-ray-absorption fine structure and Raman spectroscopy

被引:41
作者
Ramm, M
Ata, M
Brzezinka, KW
Gross, T
Unger, W
机构
[1] Sony Corp, Frontier Sci Labs, Hodogaya Ku, Yokohama, Kanagawa 2400036, Japan
[2] Bundesanstalt Mat Forsch & Prufung, D-12203 Berlin, Germany
关键词
amorphous materials; carbon; plasma processing and deposition; structural properties;
D O I
10.1016/S0040-6090(99)00641-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report core level and valence band X-ray photoelectron spectroscopy (XPS), carbon K and oxygen K near-edge X-ray-absorption fine structure spectroscopy (NEXAFS), and Raman spectroscopy results of plasma-deposited amorphous carbon generated from fullerene C-60. In comparison with evaporated C-60, the C 1s peak is broader and asymmetric for the amorphous carbon film and its shake-up satellites disappear. The valence band shows three fairly broad peaks. Only one prominent pi* resonance occurs in the NEXAFS spectrum. Recognizable structures appear in the sigma* region indicating the formation of new bonds. In the Raman spectrum the typical D and G bands were observed. The amorphization of C60 and post-plasma functionalization of the surface after exposure to atmosphere cause changes in the electronic structure. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:106 / 110
页数:5
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