Self-assembled monolayers prepared from ω-thiophene-functionalized n-alkyltrichlorosilane on silicon substrates

被引:61
作者
Appelhans, D
Ferse, D
Adler, HJP
Plieth, W
Fikus, A
Grundke, K
Schmitt, FJ
Bayer, T
Adolphi, B
机构
[1] Dresden Univ Technol, Inst Macromol Chem & Text Chem, D-01062 Dresden, Germany
[2] Dresden Univ Technol, Inst Phys Chem & Electrochem, D-01062 Dresden, Germany
[3] Dresden Univ Technol, Semicond & Microsyst Lab, D-1062 Dresden, Germany
[4] Inst Polymer Res Dresden EV, D-01069 Dresden, Germany
关键词
adsorption; self-assembled monolayers; silicon substrates; n-alkyltrichlorosilanes; thiophene-based surface;
D O I
10.1016/S0927-7757(99)00338-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Self-assembled monolayers (SAMs) of thienyl-functionalized n-alkyltrichlorosilane (11-(3-thienyl)undecyltrichlorosilane [TUTS]) have been prepared by adsorption from solution and characterized by using X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), contact angle measurements, ellipsometry, and scanning electron microscopy (SEM). Using contact angle and SEM measurements, the film preparation protocol was optimized, resulting in reproducible SAM formation with no adverse deposition of polysiloxane particles. XPS and ellipsometry studies confirmed the existence of SAM formation. AFM results show a smooth and homogeneous SAM, with Surface roughness of Ra less than or equal to 0.2 nm, which is slightly higher than the corresponding values for octadecyl-trichlorosilane (OTS) SAMs. Such thiophene-based SAM surfaces can be used for surface-initiated polymerization of thiophene. The resulting formed polythiophene layers at non-compatible surfaces offer some practical applications in manufacturing [W. Plieth, A. Fikus, D. Appelhans, H.-J. Adler, German Patent Application No. 2661977 (1998); D. Appelhans, D. Ferse, H.-J. Adler, A. Fikus, W. Plieth, B. Aldolphi et al., J. Electrochem. Sec. (accepted)]. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:203 / 212
页数:10
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