Very high rate coating deposition with intense ion and/or electron bombardment

被引：23

作者：

Korenev, SA

Coll, BF

Perry, AJ

机构：

[1] MOTOROLA INC, RES LABS, TEMPE, AZ 85284 USA

[2] ISM TECHNOL INC, SAN DIEGO, CA 92131 USA

来源：

SURFACE & COATINGS TECHNOLOGY | 1996年 / 86卷 / 1-3期

关键词：

pulsed beams; ion beam mixing; coating deposition; electron irradiation;

D O I：

10.1016/S0257-8972(96)02979-9

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The principles of a new method of high rate coating deposition are presented which are based on a pulsed ion diode with explosive emission. The equipment is flexible and can work in three regimes: pulsed ion beams, pulsed electron beams, and the deposition of films and coatings. Coatings can be deposited with ion beam mixing (coating and/or substrate), and these can be post treated with intense pulsed electron beams which allows the properties to be extensively modified. Experimental results are presented on a variety of coatings deposited on the characteristics of the diode and on different substrate materials at different temperatures; specific examples include high temperature superconductors, Tin, Tib(2) and diamond-like carbon films.

引用

页码：292 / 301

页数：10

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