Multiply charged ions by constant voltage arc ion plating and its applications

被引:3
作者
Suzuki, A
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 3A期
关键词
arc ion plating; multiply charged ion; TiN film; cutting tool; flank wear;
D O I
10.1143/JJAP.36.1245
中图分类号
O59 [应用物理学];
学科分类号
摘要
Applications of multiply charged ions are few. In the reactions between multiply charged ions and gases, different thin films are expected to be obtained. Among various methods to make thin films, are ion plating is suitable for investigating the effect of ions because of its high ionization rate. For are discharge, an ordinary constant voltage power source cannot be used, so a constant current power source is used. In order to control the discharge voltage, the author has devised a pulse power source, where the peak voltage of this pulse power source is controlled. By employing this new power source, TIN films of good quality are produced and are successfully applied to cutting tools.
引用
收藏
页码:1245 / 1249
页数:5
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